Key Findings
AVS is set to host the 26th International Conference on Atomic Layer Deposition (ALD 2026) concurrently with the 13th International Atomic Layer Etching Workshop (ALE 2026) in Tampa, Florida, from August 3-6, 2026. This pivotal international conference will focus on the cutting-edge science and technology of atomic layer control in thin film deposition and etching—techniques critical for determining semiconductor device performance. It serves as a vital forum for researchers and engineers interested in new functionalities and applications within the semiconductor industry.
Technical and Event Details
- Atomic Layer Deposition (ALD): ALD is a thin-film deposition technique based on the sequential introduction of gaseous precursors, allowing for the formation of films with atomic layer precision. This method enables highly uniform and conformal film growth even on complex three-dimensional structures. In semiconductor devices, ALD is indispensable for creating gate dielectrics, high-κ dielectric films, and passivation layers, thereby contributing to device miniaturization and performance improvement.
- Atomic Layer Etching (ALE): ALE is the reverse process of ALD, involving the precise removal of material in atomic layers. It is crucial for enhancing the accuracy and control of nanomanufacturing in next-generation semiconductor fabrication, where selective etching and damage-free processes are paramount. ALE facilitates the realization of semiconductor devices with extremely fine structures.
- Co-located Workshops: The co-location of ALD 2026 and ALE 2026 promotes a holistic discussion of atomic layer control technologies from both deposition and etching perspectives, fostering synergistic advancements. The event will feature presentations of the latest research findings, technical demonstrations, and networking opportunities with experts.
Background and Industry Context
The semiconductor industry has consistently pursued device miniaturization and performance enhancement, epitomized by Moore’s Law. Nanoscale material control is indispensable for sustaining this progress, and ALD and ALE are at the forefront of these technologies. Manufacturing devices with complex structures, such as 3D NAND flash memories and FinFETs, demands atomic-level control over film thickness and geometry. This conference is designed to provide the latest insights and solutions to meet these advanced requirements.
Future Outlook
ALD and ALE technologies are expected to find applications beyond semiconductors, extending to MEMS (Micro-Electro-Mechanical Systems), optical devices, catalysts, and biosensors. Particularly in emerging technologies like quantum computing and neuromorphic computing, atomic-level material control will be essential. Thus, the innovative technologies discussed at these conferences will form the bedrock of future technological development. The Tampa conference is set to play a significant role in shaping the future of these critical fields by bringing together leading experts.
Source: https://avs.org/about-avs/events-calendar/?event=5093
Get our weekly technology intelligence — free
Receive an infographic that lets you judge at a glance whether each field’s analysis report is worth reading.
Subscribe Free — Weekly Tech Intelligence
By subscribing, you’ll receive Troy-Technical’s weekly technology intelligence newsletter.
- Your email and selected fields are used only to deliver the newsletter.
- We never share your information with third parties.
- You can unsubscribe anytime via the link in each email.
See our Privacy Policy for details.
Takes about a minute · Unsubscribe anytime
Comments