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Imec Unlocks 22nm Pitch Single Patterning for High NA EUV Lithography, Accelerating Next-Gen Microchip Manufacturing
imec Belgium Overview Imec has announced a significant advancement in high-NA extreme ultraviolet (EUV) lithography, extending chemically amplified resists to enable single patterning of 22nm pitch line structures. This breakthrough is c... -
Samsung Unveils Industry’s Smallest 3D Stacked FET at VLSI Symposium for AI/HPC, Boosting Performance and Power Efficiency
MK South Korea Overview Samsung Electronics presented groundbreaking research on the industry's smallest "3D stacked FET" technology at the 2026 VLSI Symposium, earning the Best Paper award among over 1,000 submissions. This innovative a... -
Canon Invests ¥50 Billion in New NIL Factory in Japan, Targets 2nm Process to Challenge ASML’s EUV Dominance
Move Silicon Japan Overview Canon is investing ¥50 billion (approximately $320 million USD) in a new lithography equipment factory in Utsunomiya, Japan, to aggressively advance its Nanoimprint Lithography (NIL) technology. The company cl... -
Canon Bets Big on Nanoimprint Lithography: New Japan Fab Targets Advanced Chipmaking at 2nm Nodes
Move Silicon Japan Overview Canon is investing ¥50 billion ($320 million) in a new lithography equipment plant in Utsunomiya, Japan, aiming to triple its lithography system output and establish Nanoimprint Lithography (NIL) as a challeng...
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