Nanosheet– tag –
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Non-Precious Metal Anode ‘NiCo-LDH@Mo2CTx/NF’ Achieves 393 mV Overpotential at 100 mA cm–2 for High-Efficiency Oxygen Evolution Reaction in Anion Exchange Membrane Water Electrolysis
The Royal Society of Chemistry UK Overview This study developed a hybrid electrode, 'NiCo-LDH@Mo2CTx/NF,' as a highly efficient non-precious metal anode for anion exchange membrane (AEM) water electrolysis, combining conductive MXene (Mo... -
ACS Publications: Fully Printed Single-Layer MXene/AgNW/PVP Composite Array Developed for Structurally Decoupled Dual-Mode Tactile Perception
ACS Publications USA Overview Research in ACS Publications reports the development of a fully printed single-layer MXene/silver nanowire (AgNW)/PVP composite array for structurally decoupled dual-mode tactile perception. This innovative ... -
UK Team Achieves 73% Capacity Retention in Lithium-Sulfur Batteries After 500 Cycles with LiCl-Modified MXene Nanosheets
The Royal Society of Chemistry UK Overview A UK research team has demonstrated superior performance in lithium-sulfur (Li-S) batteries using intercalation-modified MXene nanosheets as separators. Specifically, a battery incorporating LiC... -
Metal Vacancies in 2D ZnIn2S4 Nanosheets Maximize Photocatalytic Hydrogen Peroxide Production
ACS Applied Nano Materials - ACS Publications USA Overview Research reports that defects in two-dimensional (2D) ultrathin materials play a crucial role in accelerating catalytic yields. Specifically, defective zinc indium sulfide (ZnIn2... -
Samsung Unveils Industry’s Smallest 3D Stacked FET at VLSI Symposium for AI/HPC, Boosting Performance and Power Efficiency
MK South Korea Overview Samsung Electronics presented groundbreaking research on the industry's smallest "3D stacked FET" technology at the 2026 VLSI Symposium, earning the Best Paper award among over 1,000 submissions. This innovative a... -
Advanced Nanopatterning: Nanoimprint Lithography and Directed Self-Assembly Drive Next-Gen Semiconductor Metrology
Semiconductor Engineering USA Overview As semiconductor manufacturing confronts Moore's Law limitations, Nanoimprint Lithography (NIL) and Directed Self-Assembly (DSA) are emerging as critical advanced patterning technologies. These tech...
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