Lithography– tag –
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Morphotonics Unveils Display-Centric Nanoimprint Solution to Overcome AR Waveguide Cost and Production Bottlenecks
Vertex AI Search Netherlands Overview Dutch nanoimprint lithography firm Morphotonics announced at CIOE 2026 that the key to unlocking low-cost, high-volume production of AR glasses waveguides lies not in semiconductor, but in display in... -
Imec Unlocks 22nm Pitch Single Patterning for High NA EUV Lithography, Accelerating Next-Gen Microchip Manufacturing
imec Belgium Overview Imec has announced a significant advancement in high-NA extreme ultraviolet (EUV) lithography, extending chemically amplified resists to enable single patterning of 22nm pitch line structures. This breakthrough is c... -
Nanoimprint Lithography Poised to Break Manufacturing Barriers in Nano-Optics, Highlighted at CIOE 2026
CIOE (China International Optoelectronic Expo) China Overview The 2026 "Nanoimprint Manufacturing Technology Forum" at CIOE will spotlight Nanoimprint Lithography (NIL) as a groundbreaking technique for nano-optics, offering high resolut... -
EV Group Integrates Advanced Process Technologies to Accelerate Next-Gen Co-Packaged Optics Manufacturing
IN Electronics & Design Austria Overview EV Group (EVG) has significantly expanded its semiconductor process portfolio, integrating wafer bonding, nanoimprint lithography (NIL), and thin-wafer processing to tackle the critical manufactur... -
DNP Unveils Energy-Efficient 10nm Nanoimprint Lithography for 1.4nm Logic Chips, Targeting 2027 Mass Production
Taiwan News Japan Overview Dai Nippon Printing (DNP) has announced a significant advancement in semiconductor manufacturing with its 10nm linewidth nanoimprint lithography (NIL) template, designed for 1.4nm-class logic semiconductors. Th... -
Lithography-Free Electrical Contact Method Established for 2D Materials and Van der Waals Heterostructures
MDPI Switzerland Overview This study introduces silver paint micromanipulation (SPMM) as a tabletop, lithography-free electrical contacting method for 2D materials and van der Waals heterostructures. This additive, room-temperature appro... -
Rapidus to Establish 2nm AI Chip Mass Production by 2027, Bolstering Japan’s Semiconductor Ecosystem
DataM Intelligence International Overview Japan's Rapidus, backed by government and private funding, aims to establish domestic 2nm advanced semiconductor manufacturing and mass produce AI chips by 2027. This initiative will stimulate de... -
US Semiconductor Equipment Market Driven by Next-Gen Lithography: Canon NIL, ASML High-NA EUV, Applied Materials Etch Advancements
openPR.com USA Overview This article provides an overview of a publicly available market research report. The U.S. semiconductor manufacturing equipment market is driven by advancements in next-generation lithography technologies, includ... -
Nanoimprint Lithography Offers New Path for Opto-Electronic Silicon Manufacturing, Market Projected to Reach $54.52 Million by 2027
MDPI Switzerland Overview Nanoimprint lithography (NIL) is emerging as a cost-effective alternative for fabricating diffractive grating microstructures on silicon for opto-electronic applications. This technology addresses the increasing... -
Shanghai Chip Startups Challenge Nvidia’s GPU Dominance with Sub-1nm 3D Stacking and Nanoimprint Tech
Bloomberg China Overview Shanghai chip startups are leveraging advanced 3D stacking and nanoimprint technologies to challenge Nvidia's GPU market dominance. Shanghai Atomic Technology launched a pilot line in January 2026 targeting sub-1...
