ALD– tag –
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JSON Schemas Released to Standardize ALD/ALE Processes in Materials Science, Accelerating Semiconductor Process Development
Cool Papers Unknown Overview Four domain-expert-reviewed JSON schemas have been published to standardize experimental and simulation processes for Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) in materials science. These s... -
International Team Achieves 17% Efficiency in Semi-Transparent Perovskite Solar Cells Using Sputter-Resistant ALD Aluminum Oxide Layer, Enabling 26% in Tandem Cells
pv magazine Global Unknown Overview An international research team has developed a semi-transparent perovskite solar cell boasting 17% efficiency, built upon a sputter-resistant aluminum oxide (AlOx) layer deposited via atomic layer depo... -
Forge Nano Breaks Ground on ‘America’s Battery Gigafactory’ in North Carolina, Bolstering U.S. Defense Supply Chains with 3GWh Annual Capacity
Fidelity Investments (PR Newswire) USA Overview Forge Nano has commenced construction of 'America's Battery Gigafactory' in Morrisville, North Carolina, aiming for an annual domestic battery production capacity of up to 3GWh. This projec... -
AVS to Host International Conference on Atomic Layer Deposition (ALD) and Etching (ALE) in Tampa, Florida, Focusing on Semiconductor Applications
AVS USA Overview AVS will co-locate the 26th International Conference on Atomic Layer Deposition (ALD 2026) and the 13th International Atomic Layer Etching Workshop (ALE 2026) in Tampa, Florida. This conference will specialize in the sci... -
Applied Materials Unveils New ALD and Selective Etch Systems to Advance 3D Chip Scaling
Stock Titan (Company Press Release) USA Overview Applied Materials announced new deposition (Centris Spectral SiN ALD) and selective etch systems to advance 3D chip scaling. The Centris Spectral SiN ALD system is designed for uniform, lo... -
ACS Nano Paper: ALD Enables Precise Quantum Confinement Control in Heteromorphic PbS/SnS2 Superlattices, Expanding Bandgap from 1.74 eV to 2.51 eV
PubMed (ACS Nano) International Overview A breakthrough research paper reports successful precise control of the quantum confinement effect in heteromorphic PbS/SnS2 superlattices grown by Atomic Layer Deposition (ALD). This work establi... -
Empa Spin-Off Swiss Cluster Wins Swiss Economic Award for Hybrid PVD/ALD Coating Technology
Empa (Swiss Federal Laboratories for Materials Science and Technology) Switzerland Overview Swiss Cluster, an Empa spin-off, has won the Swiss Economic Award for its innovative hybrid PVD (Physical Vapor Deposition) and ALD (Atomic Layer... -
Pennsylvania Secures $10M Investment from Kurt J. Lesker for Advanced ALD R&D, Fueling Next-Gen Semiconductor and Quantum Technologies
Commonwealth of Pennsylvania USA Overview Pennsylvania has announced a significant $10 million investment from the Kurt J. Lesker Company to advance research and development in Atomic Layer Deposition (ALD) processes. This capital inject... -
Atomic Precision Unleashed: ALD and ALE Drive Next-Gen Semiconductor Miniaturization and Performance
ELE Times India Overview Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALE) are emerging as critical nanoscale processes essential for advancing next-generation semiconductor device miniaturization and performance. These techno... -
POSTECH Breakthrough: Nanoimprint Lithography Achieves EBL-Comparable Efficiency for Scalable Metasurface Manufacturing
EurekAlert! (Pohang University of Science and Technology (POSTECH)) South Korea Overview A team from Pohang University of Science and Technology (POSTECH) has proposed innovative nanoimprint lithography (NIL) strategies to overcome limit...
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