Resonac to Initiate High-Purity HF Gas Production at Tokuyama Plant by 2026, Strengthening Domestic Semiconductor Supply

Resonac (Official Press Release) / IBTimes JP Japan

Overview

Resonac announced it will begin producing high-purity hydrogen fluoride (HF) gas for semiconductors at its Tokuyama plant in Shunan City, Yamaguchi Prefecture, within 2026. This establishes a second domestic production base alongside its Kawasaki plant, significantly enhancing the supply stability of HF gas crucial for advanced etching processes. This move is increasingly important for three-dimensional, high-density integrated semiconductor structures driven by AI and data center demand, particularly for cryogenic etching applications.

In Depth

Key Findings

Resonac announced plans to commence production of high-purity hydrogen fluoride (HF) gas, a crucial material for semiconductor manufacturing, at its Tokuyama Plant in Shunan City, Yamaguchi Prefecture, within 2026. This new production site will establish a second domestic supply base, complementing its existing Kawasaki plant, thereby significantly strengthening the stable supply system for the semiconductor industry.

Technical Details

High-purity HF gas is indispensable in the front-end semiconductor manufacturing process, particularly in etching, where it is used to form intricate patterns on silicon wafers. For high-density, three-dimensional integrated semiconductors targeting AI and data center applications, there is a growing demand for advanced etching technologies, such as cryogenic etching, which enable the creation of deeper and finer structures. Resonac’s HF gas provides the ultra-high purity and stability required for these sophisticated etching processes. The commencement of production at the Tokuyama Plant not only boosts production capacity but also diversifies supply risks, contributing to the overall resilience of Japan’s semiconductor supply chain.

Background & Context

Semiconductors are the foundational pillars supporting modern digital infrastructure, including AI, 5G, IoT, and data centers, with global demand continuously expanding. Consequently, the stable supply of materials and gases used in semiconductor manufacturing has become an international concern. High-purity gases, in particular, directly impact the quality and yield of manufacturing processes, necessitating highly reliable supply sources. Resonac’s increased HF gas production aligns with the Japanese government’s policy to strengthen the semiconductor supply chain, aiming to foster an environment where semiconductor manufacturers can operate with greater certainty through enhanced domestic supply capabilities.

Strategic Significance & Outlook

The initiation of high-purity HF gas production at the Tokuyama Plant will further enhance Resonac’s competitiveness in the semiconductor materials business. It is expected to contribute to an increased market share, especially in meeting the rising demand for cutting-edge semiconductors used in AI and HPC. Moreover, establishing multiple domestic production bases improves the supply chain’s resilience against natural disasters and geopolitical risks, providing a solid foundation for the sustainable growth of Japan’s semiconductor industry. This move reaffirms the crucial role that Japan’s materials industry plays within the global semiconductor ecosystem.

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